New ASML High-NA EUV Lithography Chipmaker Costs $380 Million

Global Update
Global Update
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Publicado 2024-02-15
ASML's High-NA extreme ultraviolet chipmaking tool called High-NA Twinscan EXE will cost around $380 million each. over twice as much as its existing Low-NA EUV lithography systems that cost about $183 million.

The High-NA EUV technology represents a major breakthrough enabling an improved 8nm imprint resolution compared to 13nm with current Low-NA EUV tools. This allows chipmakers to produce transistors that are nearly 1.7 times smaller translating to a threefold increase in transistor density on chips.
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